Atomic Layer Deposition: 1 Resource found

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Atomic Layer Deposition
FIJI
Nanofabrication Laboratory
Daily user entrance fee required Please book in increments of 30min System specification ALD with Loadlock Capable of Plasma or Thermal ALD Substrate size: Up to 200mm Substrate Temperature: up to 500C Precursors Available: Al, Hf, Pt, Si, Nb, Ti others on request Training is required before use
6 Documents Available


Industry Rates
Self:$135/hr
Service:$501/hr
Training:$501/hr