Atomic Layer Deposition: 1 Resource found
Atomic Layer Deposition 6 Documents AvailableFIJI Nanofabrication Laboratory Daily user entrance fee required
Please book in increments of 30min
System specification
ALD with Loadlock
Capable of Plasma or Thermal ALD
Substrate size: Up to 200mm
Substrate Temperature: up to 500C
Precursors Available: Al, Hf, Pt, Si, Nb, Ti others on request
Training is required before use | Industry Rates
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