Materials Characterization Lab: 32 Resources found

Park Systems xe-100 AFM.JPG
Atomic Force Microscope
PSIA 100
Sample Characterization Equipment Training Estimates: 6 Hours An Atomic Force Microscope (AFM) consists of a Si or Si3N4 microscale cantilever that has a very sharp tip (usually 5-15nm radius). The tip is brought to very close proximity to the sample surface and scanned laterally across the surface. Forces (such as mechanical contact, Van der Waals, capillary, chemical bonding, electrostatic, magnetic, etc.) between the tip and the atoms on the sample surface lead to vertical deflections of the cantilever according to Hooke’s Law. By monitoring the deflection using a laser spot reflected from the top of the cantilever onto a position sensitive photodetector array, one can construct a 3-dimensional topographic map of the sample surface. Typical image lateral resolution is in the order of the tip radius, although atomic resolution can be achieved in non-contact mode, as well. The vertical resolution can be in the order of angstroms. AFM is applicable to both electrically conductive and insulating samples and requires very little sample preparation procedures. Include Sample Description and Analysis Requirements in note section of Order Form


Industry Rates
Self:$78/hr
Service:$301/hr
Training:$301/hr
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Carbon Coater
Denton Vacuum Desk II
Sample Preparation Equipment


Industry Rates
Self:$27/hr
Service:$250/hr
Training:$250/hr
Tousimis Critical Point Dryer.JPG
Critical Point Dryer
Tousimis SAMDRI-795
Sample Prep Equipment


Industry Rates
Self:$27/hr
Service:$250/hr
Training:$250/hr
Leica UC6-FC6 microtome 1.JPG
Cryo-Ultramicrotome
Leica EM UC6-FC6
Sample prep instrument for SEM, TEM and AFM imaging


Industry Rates
Self:$27/hr
Service:$250/hr
Training:$250/hr
SZ-100 DLS a.JPG
Dynamic Light Scattering Instrument
Horiba SZ-100
Training estimate: 4 hours Include Sample Description and Analysis Requirements in note section of Order Form
2 Documents Available


Industry Rates
Self:$78/hr
Service:$301/hr
Training:$301/hr
7401F unit A.JPG
Field-emission Scanning Electron Microscope
JEOL JSM 7401F Unit 1
Sample Characterization Equipment Training Estimates and Prerequisite: 6 Hours and must have demonstrated proficiency in using JEOL 6390 SEM Features: 1. Electron optical column: Cold-cathode tip field emission gun; 1.0 nm resolution at 15 kV accelerating voltage; 0.1 – 30 kV accelerating voltage range; 25x – 1,000,000x magnification range 2. Detectors: one chamber-mounted Everhart-Thornley type secondary electron detector, one semi-in-lens secondary electron detector with r-filter and secondary electron signal enhancer, one pneumatically retractable solid state back-scattered electron detector for topographical and compositional image contrast 3. Specimen chamber and stage: large specimen exchange port accommodating 4 inch diameter and 40 mm height samples, eucentric goniometer stage with PC-automated X-, Y- and R- axes and manual Z- and Tilt- axes 4. X-ray Micro-analysis using Energy Dispersive Spectroscopy: EDAX Genesis XM2 Imaging System composed of a 10 mm2 Si(Li) detector with SUTW window for detection of all elements down to Be, and the digital electronics and software for image acquisition and x-ray signal mapping and qualitative and quantitative analysis capabilities 5. Nanometer Patterning Generation System for e-beam lithography includes NPGS PCI 516A high speed lithography board, Deben PCD beam blanking system, NPGS v9.0 control software and DesignCAD LT2000 Include Sample Description and Analysis Requirements in note section of Order Form
5 Documents Available


Industry Rates
Self:$95/hr
Service:$318/hr
Training:$318/hr
JEOL tool.png
Field-emission Scanning Electron Microscope
JEOL JSM 7401F Unit 2
JSM 7401F Unit 2 - Manufacturer: Jeol Nano Fabrication Laboratory Characterization Suite (Room 154 A) - Vibration Free Floor Training Requirements and Estimates: 6 hours and must have demonstrated proficiency in using the JEOL 6390 SEM Sample Characterization Equipment Specifications: Electron optical column: Cold-cathode tip field emission gun; 1.0 nm resolution at 15 kV accelerating voltage; 0.1 – 30 kV accelerating voltage range; 25x – 1,000,000x magnification range Detectors: one chamber-mounted Everhart-Thornley type secondary electron detector, one semi-in-lens secondary electron detector with r-filter and secondary electron signal enhancer, one semi-in-lens solid state backscattered electron detector, one pneumatically retractable solid state back-scattered electron detector for topographical and compositional image contrast Specimen chamber and stage: large specimen exchange port accommodating 4 inch diameter and 40 mm height samples, eucentric goniometer stage with fully PC-automated X-, Y-, Z-, tilt and R- axes X-ray Micro-analysis using Oxford INCA Energy Dispersive Spectroscopy composed of a 10 mm2 Si(Li) detector with SUTW window for detection of all elements down to Be, and the digital electronics and software for image acquisition, x-ray signal mapping and qualitative and quantitative analysis capabilities For SEM lab service email Miguel_Matos@uml.edu. Include Sample Description and Analysis Requirements in email.
5 Documents Available


Industry Rates
Self:$95/hr
Service:$318/hr
Training:$318/hr
LSCM FV300.JPG
Fluorescence Microscope
Olympus LSCM FV300
Sample Characterization Equipment Laser Scanning Confocal
4 Documents Available


Industry Rates
Self:$78/hr
Service:$301/hr
Training:$301/hr
Zeiss FIB tool image.jpg
Focused Ion Beam-Scanning Electron Microscope
Zeiss Auriga
Auriga FIB-SEM - Manufacturer: Zeiss (Room 154 B) - Faraday shield room Training Requirements and Estimates: 6 hours and must have demonstrated proficiency in using the JEOL 7401F FE-SEM Sample Characterization Equipment Specifications: Ga liquid metal ion source FIB specs: 7 nm @ 30 kV, 600x - 500kx magnification, 1 pA - 20 nA for fast and precise sample modification GEMINI® FE-SEM specs: 1.1 nm @ 20 kV, 20x - 900kx magnification, Thermal field emission type 0.1 - 30 kV, 2.5 nm @ 1 kV for Ultra high resolution and contrast for best SEM imaging, standard and non-conductive. In-lens EsB® detector and STEM detector CrossBeam® operation (milling and polishing with live SEM imaging capability completely independently from each other) Multi-channel gas injection system for selective etching, enhanced etching, material deposition, insulator deposition Super eucentric, fully motorized stage and dry pumping system Additional future capabilities: Omniprobe nano manipulator for the lift-out technique for TEM-STEM imaging Equip with Leica cryogenic stage for FIB milling a specimen at cryogenic temperatures. Particularly useful for the milling of biological specimens, gels, or low Tgpolymers and allows studies of wet samples with the scanning electron microscope under high vacuum conditions Note: To become a self user will require training on Zeiss Auriga SEM and FIB features. User must demonstrate proficiency on SEM before continue with FIB training. For FIB/SEM lab service email Miguel_Matos@uml.edu. Include Sample Description and Analysis Requirements in email.


Industry Rates
Self:$95/hr
Service:$318/hr
Training:$318/hr
General Lab Training
Level Two Lab Training Must be completed prior to use of instruments


Industry Rates
Training:No Charge
P1030398.JPG
Glass cutter
Leica EM KMR2
Sample Preparation Equipment no additional charge


Industry Rates
Self:No Charge
Training:No Charge
Buehler Ecomet 250 Grinder-Polisher2.JPG
Grinder-Polisher
Buehler Ecomet 250
Ecomet 250 - Manufacturer: Buehler Nano Fabrication Laboratory Characterization Suite (Room 154 C) Training Requirements Estimates: 1 hour Simple Operation Touch screen Pro version or tactile feedback membrane control Easy to actuate blue flashing iridescent Power standby button Large, red and easily accessible emergency-stop button for safety Variable Speed Power Head Single & Central force operation Variable speed for complimentary or contra rotation Accessible Work-space D-style bowl for easy platen changing Removable splash guard minimizes splashing Bowl cover protects platen while not in use Clean-ability Retractable water hose for wash down Disposable bowl liner for quick cleaning Integrated 360 deg bowl rinse


Industry Rates
Self:$27/hr
Service:$250/hr
Training:$250/hr
Struers DP-U4 Polisher.JPG
Grinding and Polishing System
Struers DP-U4
Sample Preparation Equipment


Industry Rates
Self:$27/hr
Service:$250/hr
Training:$250/hr
Agilent 7900 ICP-MS.jpg
Inductively Coupled Plasma - Mass Spectrometer
Agilent 7900


Industry Rates
Self:$104/hr
Service:$327/hr
Training:$327/hr
Agilent 5110 ICP-OES a.jpg
Inductively Coupled Plasma - Optical Emission Spectrometer
Agilent 5110


Industry Rates
Self:$99/hr
Service:$322/hr
Training:$322/hr
Fischione ionmill 1.JPG
Ion Mill
Fischione 1010
Sample Preparation Equipment


Industry Rates
Self:$20/hr
Service:$201/hr
Training:$201/hr
Lab Staff Expertise-Analysis Interpretation
Technical expertise beyond "Assisted Use"


Industry Rates
Special:$223/hr
Isomet 11-1180 Low Speed Saw.JPG
Low Speed Saw
Isomet 11-1180
Sample Preparation Equipment


Industry Rates
Self:$27/hr
Service:$250/hr
Training:$250/hr
MCL Technologist


Industry Rates
Service:$162/hr
Wyko Optical Profiler.JPG
Optical Profiling system
Wyko NT2000
Sample Characterization Equipment Training Estimates : 4 Hours Surface heights measurement 1. Phase-shifting interferometry (PSI) mode allows measuring fairly smooth and continuous surfaces (0.1 nm < heights < 160 nm). 2. Vertical scanning interferometry (VSI) mode measurse rough surfaces and heights ranging between 160 nm and 2 mm. Include Sample Description and Analysis Requirements in note section of Order Form


Industry Rates
Self:$78/hr
Service:$301/hr
Training:$301/hr

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